Skip to main content
Apparatus used in the MATEIS laboratory
Preparation techniques
- Gold, aluminium oxide or and carbon metallisation
- Wire sawing
- Ultrasonic cutting
- Tripod
- Electropolishing
- Vibratory finishing
- Ultramicrotomy at room temperature
- PIPS
Optical microscopy
- Zeiss AxioPhot - reflection, transmission, polarised light etc.
- Scanning electron microscope: Zeiss Supra 55VP equipped with:
- In situ decontamination system (Evactron by XEI Scientific)
- EDS analysis (X-max SDD 80 mm² by Oxford Instruments)
- EBSD (Nordlys camera by Oxford Instruments)
- In situ traction board (Gatan)
- Transmission electron micrscope : JEOL 200CX equipped with :
- Orius camera (Gatan)
- Single-tilt, double-tilt, tilt-rotation slide
- EDS analysis (xxx by Oxford Instruments)
Apparatus used at the Centre Lyonnais de Microscopie (CLYM)
Environmental scanning electron microscope (FEI ESEM XL-30 FEG)
- EDS analysis (X-max 50 mm² by Oxford Instruments)
- Peltier board
- Heating boards (1000 and 1500°C)
- Wet-STEM « home-made » rack
- “Home-made” Peltier tomographic rack
- Traction board
- « Home-made» traction-heating board
- Micro-injecter
Transmission electron microscope (JEOL 2010F)
- Orius camera (Gatan)
- EDS analysis (X-max 80 mm² by Oxford Instruments)
- Electron energy loss spectrometer (DigiPEELS de Gatan)
- STEM-HAADF modulus
- Simple-tilt, double-tilt and cold slide(N2) JEOL, double-tilt GATAN BE analysis, NANOFACTORY nano-indentation, "home-made" connector for single-tilt +/-85° tomography
Environmental scanning electron microscope (FEI Titan ETEM G2 80-300 kV)
- Mass spectrometer, plasma cleaner in situ
- STEM-HAADF modulus
- « Lens » type spherical aberration correction
- Standard, tomographic, heating, double-tilt slides
Focused-ion beam (ZEISS NVision40, GEMIN SEM column, SII Ion Beam column)
- STEM low-voltage sensor
- Manipulator (Klocke)
- EBSD : rapid Nordlys 2S camera, Oxford Instruments
- EDS : SDD X-max 50 mm², Oxford Instruments
- FIBICS : Very high resolution external scanning system (FIB/SEM) for nanopatterning and high resolution 3D
- FLOODGUN : load control
- GIS : C, W, SiOx, H2O, XeF2
- Secondary Ion Detector